The writing method of appearance patent statement is: identify yourself, make it clear that the statement is a statement of examination opinions issued by the patent administrative department of the State Council, and at the same time state the explanation of patent modification according to the examination opinions. Finally, make it clear that the examiner hopes to pass this patent examination and grant the patent right.
legal ground
Article 27 of the Patent Law of People's Republic of China (PRC) Where an applicant applies for a patent for design, he shall submit a written request, a picture or photograph of the design, a brief description of the design and other documents. The relevant pictures or photographs submitted by the applicant shall clearly indicate the design of the product for which patent protection is required.