Introduction to the core technology and principle of the optical film thickness gauge (SpectraThick Series)
The characteristics of the SpectraThick series are non-contact, non-destructive measurement, no need for sample pre-processing, and software support Windows operating system, etc. ST series is an instrument that uses visible light to measure the thickness of oxide films, nitride films, photo-resist and other non-metallic films formed on substrates such as wafer and glass.
The measurement principle is as follows: vertically illuminate visible light on the film on the measured wafer or glass. At this time, part of the light is reflected on the surface of the film, and the other part penetrates the film, and then passes between the film and the bottom layer (wafer). or glass) interface reflection. At this time, the light reflected from the surface of the film interferes with the light reflected from the bottom of the film. The SpectraThick series is an instrument that uses this interference phenomenon to measure film thickness.
The light source of the instrument uses Tungsten Lamp, and the wavelength range is 400 nm ~ 800 nm. Using this principle from ST2000 to ST7000, the diameter size of the measurement area is 4μm ~ 40μm (2μm ~ 20μm optional). As one of the most important products of K-MAC Co., Ltd., ST8000-Map has an image process function and is a new concept thickness measuring instrument that goes beyond the limits of general film thickness measuring instruments. The minimum diameter of the measurement area is 0.2μm, which is far beyond the measurement limit of general thickness measuring instruments (4μm). The thickness map (Thickness Map), which can only be obtained by measuring dozens of points in sequence, can also be measured at one time, greatly improving the speed and accuracy. This technology has been patented.
Another advantage of the K-MAC SpectraThick series is that it can also measure the thickness of films formed on rough surfaces (such as iron plates and copper plates) that cannot be measured with general instruments. This is the measurement principle on a new concept called VisualThick OS. In addition to measuring film thickness, it also has the function of measuring transmittance, surface resistance, contact angle, etc. of the ITO film formed on glass.
Product Description
This instrument is a product that shines UV-Vis light on the measurement object and uses the light reflected from the measurement object to measure the thickness of the film.
This product is mainly used in research and development or production of conductor thin films, especially as
In-Line monitoring instruments in semiconductor and related display work.
Product characteristics
1) Because it uses light, it is non-contact and non-destructive and will not affect the experimental samples.
2) The thickness and n,k data of the film can be obtained.
3) The measurement is quick and accurate, and there is no need to destroy or process the experimental sample for measurement.
4) Can measure multi-layer films within 3 layers.
5) You can freely choose manual or automatic type according to the purpose.
6) The products are available in various styles, and products can also be designed according to customer requirements.
7) Can measure the film thickness on Wafer/LCD (Stage size 3")
8) Table Top type, suitable for universities, research laboratories, etc.