Guide wire dsa shielding path mode

The method is to project the pattern on the mask onto the surface of the sample by optical projection for pattern transfer. In the guide wire DSA, the electron beam is controlled by the electronic mask aligner, and the pattern is written directly on the sample surface. This technology has the advantages of high resolution, high precision and high flexibility, and can realize very complex micro-nano structures. Direct writing beam lithography and mask lithography are two commonly used micro-nano processing technologies.