Is alkyl mercaptan hydrophilic or hydrophobic?

Alkyl mercaptan is hydrophilic, and the aqueous solution of alkyl mercaptan self-assembled monolayer contains a mixture of alkyl mercaptan and nonionic surfactant, which is used to form micelle network in aqueous solution, and a method for forming alkyl mercaptan self-assembled monolayer using the aqueous solution. Aqueous solution for forming alkyl mercaptan self-assembled monolayer and method for forming monolayer using the aqueous solution. More specifically, an aqueous solution containing a mixture of alkyl mercaptan and nonionic surfactant for forming an alkyl mercaptan self-assembled monolayer on a substrate, and a method for forming a monolayer using the solution. Self-assembled monolayers (SAMs) are ordered monolayers of organic compounds that spontaneously absorb from solution or gas phase onto solid substrates. This organic compound consists of chemical functional groups with specific affinity for the target matrix. According to the choice of organic compounds and the displayed chemical functions, the formation of SAM on the target substrate will change the characteristics of the target substrate. Since the specific compound forming SAM can be designed, the present invention provides the possibility of generating various new characteristics on the existing surface. In fact, from the prior art, SAM technology has been used to obtain favorable characteristics on existing materials, such as corrosion resistance and wear resistance. Furthermore, as known from the prior art, SAM can be formed by using a metal matrix. Therefore, technologies involving SAM are ubiquitous in the electronics industry. The prior art provides several organic compounds with specific chemical functional groups, which are known to be attached to specific metals, metal oxides and semiconductors. Specifically, more common examples are derivatives of alkyl mercaptans. The bond formed between SAM and solid matrix is easy to oxidize and decompose. This will adversely affect the structure, thus adversely affecting the quality of the SAM formed on the substrate. An example of the method to prevent or prevent the decomposition of SAM layer is published in US Patent PublicationNo. 2005/022 108 1 in the name of Liu et al. on October 6, 2005. The method described in this publication uses a solvent, which can be water, an aqueous solvent, an aqueous buffer or a mixture thereof. However, like most used methods, the SAM formation method is a slow process, which takes several hours and/or days to complete.