Shanghai Xinyang: It is expected that ASML-1400 mask aligner will enter the partner site before the end of March.
65438+10.5, Shanghai Xinyang announced that the company had signed a cooperation framework agreement with North IC Technology Innovation Center (Beijing) Co., Ltd., and both parties would cooperate to build a photoresist verification platform in the factory designated by North IC Technology Innovation Center (Beijing) Co., Ltd.
In the future, the ASML-1400 mask aligner purchased by the company for developing 193nm ArF dry photoresist will be placed in the place designated by the partner, and can be debugged and used after the base is installed. It is estimated that mask aligner will enter the partner's site before the end of March 2002/KLOC-0.
Shengquan Group IPO will be held, and it is planned to raise 654.38+0.2 billion yuan to lay out the upstream photoresist materials.
65438+1On October 7th, China Securities Regulatory Commission held the fourth meeting of the 18th Issuance Review Committee, and Jinan Shengquan Group Co., Ltd. (IPO) was approved.
According to the prospectus, the company intends to publicly issue ordinary shares of no more than RMB 654.38 billion this time, which is not less than 654.38+00% of the share capital after this issuance. After deducting the issuance expenses, the raised funds will be invested in the following projects in priority order:
Source: Shengquan Group
70 million strands of Jing Rui were introduced into the ArF mask aligner.
19 10/9 19, Jing Rui co., ltd released the announcement on the progress of purchasing mask aligner equipment. According to the announcement, the company has successfully purchased a model of ASML XT 1900 Gi mask aligner.
The equipment purchased from mask aligner is ASML XT 1900 Gi ArF immersion mask aligner, which can be used to develop high-end photoresist with the highest resolution of 28nm. The equipment arrived in Suzhou on 202119, and successfully moved into the company's high-end photoresist research and development laboratory.
The project with an annual output of 1600 tons of photoresist materials settled in Shandong.
On June 23rd, the centralized signing ceremony of 202 1 project was held in Nanhai New District, Weihai, Shandong Province. 1 1 project was collectively signed. The projects signed this time include photoresist core materials and other projects.
Among them, the main body of the photoresist core material project is Shandong Kelaifu Photoelectric Technology Co., Ltd., which was established in June 2020. The project has a building area of 30,000 square meters, and it is planned to build a new material production base including the production of pigment green G58.