The upstream high-purity metal raw materials are monopolized by Japan and the United States. High-purity sputtering target requires very high purity of metal materials. Although the domestic smelting capacity of copper, aluminum, titanium and other metals occupies the main market share in the world, the domestic metal purification technology is limited, which can not meet the production requirements of high-purity sputtering targets.
After decades of development and technology accumulation, foreign enterprises have a deep foundation in brand, technology, product quality, scale and customer resources. These foreign multinational companies have the advantage of supporting the supply of high-purity metal raw materials in the upstream, concentrated customer resources in the downstream application field, technological first-Mover advantage and scale advantage in the target manufacturing process, so the monopoly position of these companies in the sputtering target field in the United States and Japan is still the normal state that domestic sputtering target enterprises must deal with in the future.