ITO material is an N-type semiconductor material, including ITO powder, target, conductive paste and ITO transparent conductive film. Its main applications are divided into flat panel display (FPD) industries, such as liquid crystal display (LCD), thin film transistor display (TFT-LCD), electroluminescent display (el), field emission display (FED), electroluminescent flat panel display (OELD) and plasma display (PDP).
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The domestic demand for ITO targets has greatly increased, and the density of ITO targets produced in China is low, which can not meet the requirements of high-end flat panel display industry for target quality, and is only partially used in low-end liquid crystal products. At present, only a few developed countries and regions such as Japan, the United States and Germany can produce ITO targets, but 98% of the ITO targets needed by China's flat panel display industry depend on imports. Therefore, developing ITO target production technology is the first choice for existing production enterprises to develop deep processing technology.
The production technology and technical equipment of ITO target abroad are mature and stable. The main preparation methods are hot isostatic pressing, hot pressing and sintering.