Main functions:
1, scanning and detecting point by point;
2. Computer analysis and calculation of epitaxial wafer integration, light intensity and main wavelength. Peak wavelength, spectral half width and other parameters;
3. Display the distribution and data in the form of drawing, cross-sectional distribution map and single-point spectrum;
4. Display the statistical results of each parameter;
5. Display the statistical parameters of the selected range;
6. Local scanning can be carried out, and isolated points and edges can be removed from the scanning results;
7. Measure the film thickness by white light reflection spectrum, and display the distribution and data in the form of drawing;
8, equipped with offline data processing software.
The instrument runs reliably and has a compact structure. All detection and data processing are completed automatically by the computer. User-friendly window interface is adopted, which is easy to operate. Users can use it with little training, and they can choose different lasers according to different epitaxial wafers.