1, magnetron sputtering thermal insulation film, also known as magnetron sputtering metal film, is made by multi-layer magnetron sputtering process and is famous for its excellent performance of durable reflection and thermal insulation. Because of its high definition, high thermal insulation, high stability, low internal reflection, pure color, never fading, long service life and many other characteristics, it was once widely used in automobile window film and building window film.
2. Magnetron sputtering technology is widely used in the field of thin film manufacturing, which can manufacture all kinds of thin films needed by industry. Such as superhard films, corrosion-resistant and friction-resistant films, superconducting films, magnetic films, optical films, thermal insulation films and various films with special electrical properties.
3. Simply put, the manufacturing process of magnetron sputtering heat insulation is to bombard precious metal rakes such as nickel, silver, titanium, gold, indium, copper and aluminum. In a vacuum environment, metal ions are uniformly sputtered on the optical grade PET substrate by magnetic field control, and a metal coating is deposited.
4. Thermal insulation principle: magnetron sputtering thermal insulation film belongs to reflective thermal insulation film. It is to plate molecules of metals such as nickel and silver on the safety base layer by sputtering, and these metal layers will selectively reflect various heat energy in the sun, including infrared, ultraviolet and visible light. So as to effectively pray for heat insulation and protect the human body and the interior of the car from ultraviolet rays.
Secondly, the metal film adopts magnetron sputtering technology.
Three, generally speaking, the use of sputtering process for thin film coating has several characteristics:
(1) metal, alloy or insulator can be made into thin film materials.
(2) Under proper setting conditions, films with the same composition can be prepared from multi-element and complex targets.
(3) By adding oxygen or other active gases into the discharge atmosphere, a mixture or compound of target substances and gas molecules can be prepared.
(4) The target input current and sputtering time can be controlled, and high-precision film thickness can be easily obtained.
(5) Compared with other processes, it is beneficial to produce large-area uniform films.
(6) Sputtering particles are hardly influenced by gravity, and the positions of the target and the substrate can be freely arranged.
(7) The adhesion strength between the substrate and the thin film is more than 65,438+00 times that of the general evaporation film, and the sputtered particles will continue to diffuse on the film-forming surface due to high energy, and the substrate can obtain a crystalline thin film at a lower temperature.
(8) At the initial stage of film formation, the nucleation density is high, and an extremely thin continuous film below 10nm can be produced.
(9) The target has long service life and can be automatically and continuously produced for a long time.
(10) The target can be made into various shapes, and the special design of the machine can achieve better control and the most efficient production.