1978 successfully developed the first graphic generator in China.
1984 successfully developed the first walking mask aligner in China, and won the first prize of scientific and technological progress in electronic industry.
1993 successfully developed the first double-sided mask aligner in China, and won the national new product award and the third prize of scientific and technological progress in electronic industry.
1997 successfully developed the first ultra-low temperature array probe test bench in China and won the second prize of scientific and technological progress in electronic industry.
1997 successfully developed the first fully automatic probe test-bed in China.
In 2005, the national key scientific research project "SB-60 1 Double-sided mask aligner" passed the design finalization and acceptance. This equipment is the first practical 6-inch double-sided mask aligner in China, which is at the leading level in China.
In 2005, it owned three patents, namely, electroplating forming device technology of diamond inner circular blade, special brushless motor drive device for rotary washing equipment and ink print head, and won the silver award in the 15th National Invention Exhibition.
In 2005, the 8-inch wafer thinning machine passed the national appraisal, and the feed resolution of this equipment can reach 0. 1μm, which is advanced in the world. On this basis, the 60μm wafer is thinned first in China.