The preparation process of high-end sputtering target generally adopts vacuum hot pressing method or vapor deposition method, and the production process is automatic and continuous. At present, high-purity metal and alloy sputtering targets have been widely used in solar cells, coatings, semiconductors and other fields, and play a vital role in these fields.
With the rapid development of science and technology in China and the increasing demand for high-end sputtering targets in the domestic market, domestic high-end sputtering target manufacturers have also risen rapidly. These enterprises are committed to constantly improving their technical level, mastering the latest production technology, and providing customers with the best solutions in terms of product quality and service, thus contributing to the successful development of high-tech undertakings in China.