1, Nanda Optoelectronics
In terms of photoresist, the company has established a professional R&D team, and established a large-scale R&D center and 100 upgraded photoresist pilot production line. The progress and achievements of product R&D have been recognized by industry experts. Secondly, the company has the ability to develop functional monomers, functional resins and other photoresist materials, and a number of advanced photoresist products have been well received by customers.
2. High light sensitivity
Since its establishment, the company has been focusing on R&D and producing photoresist and PCB photosensitive ink. The company's photoresist products are ultraviolet positive glue and ultraviolet negative glue, and the main application fields are flat panel display, light emitting diodes, integrated circuits and so on.
3. Jing Rui Electric Materials Company
The company is one of the few enterprises that mass-produce photoresist in China. After years of research and development and accumulation, the company's photoresist products have reached the advanced level at home and abroad, the photoresist product sequence is complete, and the industrialization scale and profitability are at the leading level in the industry.
4. Process new materials
Established in 2004, the subsidiary is the only photoresist enterprise in China that owns the Dutch ASML exposure machine, and it is also an enterprise with independent research and development and production of high-grade photoresist.
Introduction of photoresist
Photoresist, also known as photoresist, refers to a thin film material etched by an anti-corrosive agent whose solubility changes through ultraviolet light, electron beam, ion beam and X-ray irradiation or radiation. A photosensitive mixed solution is composed of photosensitive resin, photosensitizer and solvent. In the process of lithography, it is used as an anti-corrosion coating material. When processing a semiconductor material on a surface, a desired image can be obtained on the surface if an appropriate selective photoresist is used.
Photoresist can be divided into positive and negative according to the image it forms. In the photoresist process, after the coating is exposed and developed, the exposed part is dissolved, leaving the unexposed part. The coating material is positive photoresist. If the exposed part is left and the unexposed part is dissolved, the coating material is negative photoresist.
According to the difference of exposure light source and radiation source, it can be divided into ultraviolet glue (including positive and negative ultraviolet glue), deep ultraviolet glue, X-ray glue, electron beam glue and ion beam glue. Photoresist is mainly used for fine graphic processing operations, such as display panels, integrated circuits and semiconductor discrete devices. The production process of photoresist is complex and there are many varieties and specifications. In the manufacturing of integrated circuits in electronic industry, there are strict requirements for the photoresist used.
The above contents refer to Baidu Encyclopedia-Jiangsu Nanda Optoelectronic Materials Co., Ltd..